Aggregation methods for a scheduling problem on parallel machines in the photolithography area of the semiconductor manufacturing industry
1 : Département Sciences de la Fabrication et Logistique
Mines Saint-Etienne, Univ Clermont Auvergne, CNRS, UMR 6158 LIMOS, Centre CMP, STMicroelectronics
2 : Département Sciences de la Fabrication et Logistique
(SFL-ENSMSE)
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Site web
Ecole Nationale Supérieure des Mines de Saint-Etienne, CMP-GC
880, route de Mimet 13541 GARDANNE - FRANCE -
France
3 : Ecole Nationale Supérieure des Mines de Saint-Etienne, Centre Microélectronique de Provence
(EMSE-CMP)
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Site web
Ministère du Redressement productif
CMP - Site Georges Charpak 880, route de Mimet F-13541 Gardanne - France -
France
Semiconductor manufacturing includes the most complex manufacturing processes. Scheduling problems to be addressed at the operational level involve a rich set of constraints and criteria. As a result, optimization algorithms are increasingly preferred over dispatching rules, especially in complex production areas such as the photolithography area which is considered in this paper.